Instant refreshing Aftersun Mask

After-sun face mask, for skin stressed by the sun and to promote a more intense tan and prolonged.

Formulated with:
• Hyaluronic acid with 3 molecular weights (3-LURONICS technology) limits transepidermal dehydration and stimulates production of collagen in the dermis;
• Actives of Chamomile and Oat refresh the skin and help mitigate skin redness.
Promotes skin brightness.

For all skin types, even the most sensitive.
To immediately refresh and hydrate the skin after exposure to the sun.

RESULT
+ 16% hydration at the first application and softer skin bright in 95% of people in 2 months.
*Clinical, instrumental and self-assessment tests conducted by a dermatologist on 20 people.

How to use
Apply the mask to the face after cleansing as indicated on the package.
Leave on for 15 minutes. Gently massage the product in excess until completely absorbed.

Ingredients
AQUA (WATER), GLYCERIN, SODIUM HYALURONATE, HYDROLYZED HYALURONIC ACID, CHAMOMILA RECUTITA FLOWER EXTRACT, OATS SATIVA (OAT) KERNEL EXTRACT, LACTIC ACID, MANDELIC ACID, KOJIC ACID, 1-METHYLHYDANTOIN-2-IMIDE, HYDROXYETHYLCELLULOSE, 1,2-HEXANEDIOL, CAPRYLYL GLYCOL, DISODIUM EDTA, POTASSIUM SORBATE, SODIUM HYDROXIDE.
Without:  ; parabens, dyes, alcohol, perfume, phthalates, sulfates, petrolatum, phenoxyethanol, silicones.

Warnings
External use, do not apply on damaged or irritated skin .

Format
1 mask.